Kiyoshi Yoshikawa, Kyoto University, RMUTT, Japan

Jun Ma, Harbin Institute of Technology, China

Yanan Liu, Donghua University, China

Pan Li, Tongji University, China

Koichi Takaki, Iwate University, Japan

Yoshikatsu Ueda, Kyoto University, Japan

Chiti Sritontip, Rajamangala University of Technology Lanna

Jun Hu, Shanghai University, China

Yanan Liu, Donghua University, China

Pan Li, Tongji University, China

Yoshikatsu Ueda, Kyoto University, Japan

Katsuyuki Takahashi, Iwate University, Japan

Krischonme Bhumkittipich, Rajamangala University of Technology Thanyaburi, Thailand

Luhai Chen, Shanghai Jinxiang Environment Technology Co., Ltd. 

Qingquan Lan, Nanjing TianQi Advanced Oxidation Technology Co., Ltd.

Jinglin Wan, Nanjing Suman Plasma Technology Co., Ltd.

Jun Hu, Shanghai University, China

Lijuan Zhang, Shanghai Advanced Research Institute, CAS, China

Douyan Wang, Kumamoto University, Japan

Dongping Liu, Dalian University of Technology, China

Dingxin Liu, Xi'an Jiaotong University, China

Tiecheng Wang, Northwest A&F University, China

Banjerd Saengchandr, Rajamangala University of Technology Lanna

Boonyang Plangklang, Rajamangala University of Technology Thanyabur

Chanchai Dechthummarong, Rajamangala University of Technology Lanna

Fenghua Zhang, Beijing University of Chemical Technology, China

Krischonme Bhumkittipich, Rajamangala University of Technology Thanyaburi

Masafumi Ito, Meijo University, Japan

Shoichiro Hamamoto, The University of Tokyo, Japan

Sorapong Pavasupree, Rajamangala University of Technology Thanyaburi

Sumonman Niamlang, Rajamangala University of Technology Thanyaburi

Takashi Hata, Kochi Institute of Technology, Japan

Takayuki Ohshima, Gunma University, Japan

Takehiko Sato, Tohoku University, Japan

Uthen Kamnarn, Rajamangala University of Technology Lanna

Vishnu Thonglek, Rajamangala University of Technology Lanna, Thailand

Wen Zhang, New Jersey Institute of Technology, USA

Xianren Zhang, Beijing University of Chemical Technology, China

Xuehua Zhang, University of Alberta, Canada

Yomei Tokuda, Shiga University, Japan

Zhaojun Li, The Institute of Process Engineering, CAS, China

Jinglin Wan, Nanjing Suman Plasma Technology Co., Ltd.